CDSEM（線寬檢測(cè)）
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關(guān)鍵詞：
半導(dǎo)體設(shè)備、半導(dǎo)體工藝
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產(chǎn)品描述
CD-SEMs (critical dimension scanning electron microscopes) are widely used as the main tool for CD measurement in semiconductor processes. In recent years they have helped in achieving improved precision for smaller design rules, and faster measurements for greater numbers of measurement points. New functions have also been implemented, such as automation of measurements through the effective utilization of design data, and measurement of hazardous locations using positional information.
產(chǎn)品詢價(jià)
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